YOUR FIRST SHIFT / GUIDED PRACTICE
Take your first wafer
from entry to thin film.
Meet your guide, prepare for the cleanroom and learn why your deposition recipe works. One next action takes you through the first three operations in the campus route.
NEXT ACTION · 1 OF 7
Meet Dr. Lin
Get your first-shift briefing. On the fab floor, choose “Walk to next objective”, then talk to your guide.
Meet your guide →- 1
Meet Dr. Lin
Get your first-shift briefing. On the fab floor, choose “Walk to next objective”, then talk to your guide.
Your next action - 2
Gown for the cleanroom
Follow the route to the lockers and equip the suit, hood, mask, gloves and boots.
Upcoming - 3
Pass through the air shower
Walk inside the entry chamber and wait for the eight-second teaching cycle to finish.
Upcoming - 4
Qualify the reticle
At the HOYA / AGC materials exhibit, complete the linked inspection cases and explanation, then release the qualified replacement.
Upcoming - 5
Prepare the wafer surface
At the SCREEN-inspired station, complete the linked wash–rinse–dry lesson, then meet the campus rinse-coverage target and finish the cycle.
Upcoming - 6
Learn how deposition works
Study the mechanism, complete a predicted experiment, solve the changed-wafer problem and explain the limiting rate.
Upcoming - 7
Run and release your first film
Return to the ASM-inspired console. Meet the original training-lot target of 30–85 nm and finish the cycle. The lesson’s changed-wafer problem uses a different target.
Upcoming
Your first-film practice
Find all nine process courses and their completion states in My learning →
Deposition practice
○ A completed experiment with a prediction
○ A completed changed-wafer run meeting 18–22 nm at no more than 500°C
○ A correct explanation of the limiting rate
Progress is stored in this browser. It is practice evidence, not an account assessment, credential or authorization to operate real equipment. Demonstrations alone do not complete these tasks.
Back to My learning →